Mentor Graphics, UMC Validate Accuracy of UMC's 65nm Physical Verification Flows Using Calibre nmDRC

Mentor Graphics Corp has worked with UMC to validate the accuracy of UMC's 65nm physical verification flows using the Calibre nmDRC product.

Using one of UMC's advanced 65nm customer products as the test design, the cooperative effort claims to have verified that UMC's 65nm Calibre production decks accurately reflect the design rule manual for this node, providing UMC customers with greater confidence in the manufacturability of their 65nm chip designs.

The Calibre tool's is internally used by UMC's engineering groups and is the first available for each new technology node. The companies previously partnered to demonstrate the performance of the Calibre nmDRC product with Hyperscaling.

Calibre nmDRC is an important component of the overall Calibre nm platform that provides customers solutions for DRC, LVS, extraction, critical area analysis (CAA), critical feature analysis (CFA), chemical mechanical polishing (CMP), and litho friendly design (LFD) analysis -- all required to solve yield challenges in the nanometer era.

source:
http://techon.nikkeibp.co.jp /english/NEWS_EN/20080505/151336/